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Pulse‐time‐modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch‐free polycrystalline silicon patterning
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10.1063/1.111290
/content/aip/journal/apl/64/25/10.1063/1.111290
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/25/10.1063/1.111290
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/content/aip/journal/apl/64/25/10.1063/1.111290
1994-06-20
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pulse‐time‐modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch‐free polycrystalline silicon patterning
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/25/10.1063/1.111290
10.1063/1.111290
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