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Application of x‐ray interference method for residual strain measurement in low energy Ar ion‐bombarded Si (001)
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10.1063/1.111945
/content/aip/journal/apl/64/4/10.1063/1.111945
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/4/10.1063/1.111945
/content/aip/journal/apl/64/4/10.1063/1.111945
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/content/aip/journal/apl/64/4/10.1063/1.111945
1994-01-24
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Application of x‐ray interference method for residual strain measurement in low energy Ar ion‐bombarded Si (001)
http://aip.metastore.ingenta.com/content/aip/journal/apl/64/4/10.1063/1.111945
10.1063/1.111945
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