1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Influence of the high voltage pulse shape on the plasma source ion implantation process
Rent:
Rent this article for
USD
10.1063/1.112715
/content/aip/journal/apl/65/18/10.1063/1.112715
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/18/10.1063/1.112715
/content/aip/journal/apl/65/18/10.1063/1.112715
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/65/18/10.1063/1.112715
1994-10-31
2015-07-07
Loading

Full text loading...

This is a required field
Please enter a valid email address

Oops! This section does not exist...

Use the links on this page to find existing content.

752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of the high voltage pulse shape on the plasma source ion implantation process
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/18/10.1063/1.112715
10.1063/1.112715
SEARCH_EXPAND_ITEM