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Implantation and transient B diffusion in Si: The source of the interstitials
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10.1063/1.112725
/content/aip/journal/apl/65/18/10.1063/1.112725
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/18/10.1063/1.112725
/content/aip/journal/apl/65/18/10.1063/1.112725
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/content/aip/journal/apl/65/18/10.1063/1.112725
1994-10-31
2014-09-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Implantation and transient B diffusion in Si: The source of the interstitials
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/18/10.1063/1.112725
10.1063/1.112725
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