No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Silicon wafer bonding studied by infrared absorption spectroscopy
1.Technical Digest of IEEE 1985 International Electron Devices Meeting, Washington, DC (IEEE, New York, 1985), p. 684.
2.Technical Digest of IEEE 1986 International Electron Devices Meeting, Washington, DC (IEEE, New York, 1986), p. 210.
3.R. Stengl, T. Tan, and U. Goesele, Jpn. J. Appl. Phys. 28, 1735 (1989).
4.W. P. Maszara, J. Electrochem. Soc. 138, 341 (1991).
5.L. Ling and F. Shimura, J. Appl. Phys. 71, 1237 (1992).
6.K. Ljungberg, A. Soederbaerg, and Y. Baecklund, Appl. Phys. Lett. 62, 1362 (1993).
7.Q.-Y. Tong, E. Schmidt, and U. Goesele, Appl. Phys. Lett. 64, 625 (1994).
8.H. Himi, M. Matsui, S. Fujino, and T. Hattori, Jpn. J. Appl. Phys. 33, 6 (1994).
9.Physisorbed species (Ar, Xe, Kr, CO, and ) cause a shift of the Si-H stretch mode between 5 and [M. Suhren et al., (unpublished)], indicating that the position of this mode is sensitive to the proximity of other species even when the interactions are weak (e.g., van der Waals).
10.R. K. Iler, The Chemistry of Silica (Wiley, New York, 1979), pp. 622–729.
11.G. Kissinger and W. Kissinger, Sens. Actuat. A 36, 149 (1993);
11.B. E. Roberds and S. N. Farrens, Proceedings of the Second International Symposium on Wafer Bonding: Science, Technology and Applications, edited by M. A. Schmidt, T. Abe, C. Hunt, and H. Bumgart, Proceedings Volume 93–29 (The Electrical Society, 1993), p. 240.
12.Y. J. Chabal and S. B. Christman, Phys. Rev. B 29, 6974 (1984).
13.The perpendicular absorption is times stronger than the parallel absorption at the interface and than the absorption at the outer surfaces (internal reflection). Experimentally, the enhancement is estimated by comparing the perpendicular components of the Si-H absorption of HF-etched Si(100) before and after bonding (≈20) and our data on H in oxide with those of H. Ogawa and T. Hattori, Appl. Phys. Lett. 61, 577 (1992) (≈24).
14.For hydrophobic samples, rinsing was necessary for joining because of dust particles on the unrinsed surfaces (poor air quality). After rinsing, HF-etched wafers could be partially joined. While most of the joined wafers separated upon subsequent handling (dicing, beveling, or chemical cleaning), some remained joined and were used for this study. Such samples could then be bonded by annealing to 1100 °C.
15.Y. J. Chabal, G. S. Higashi, K. Raghavachari, and V. A. Burrows, J. Vac. Sci. Technol. A 7, 2104 (1989).
16.J. A. Schaefer, D. Frankel, F. Stucki, W. Gopel, and G. J. Lapeyre, Surf. Sci. 139, L 209 (1984).
17.Y. J. Chabal, Surf. Sci. 168, 594 (1986).
Article metrics loading...
Full text loading...
Most read this month
Most cited this month