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Chemical vapor deposition of heteroepitaxial Si1−xy Ge x C y films on (100)Si substrates
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10.1063/1.112635
/content/aip/journal/apl/65/20/10.1063/1.112635
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/20/10.1063/1.112635
/content/aip/journal/apl/65/20/10.1063/1.112635
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/content/aip/journal/apl/65/20/10.1063/1.112635
1994-11-14
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical vapor deposition of heteroepitaxial Si1−x−yGexCy films on (100)Si substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/20/10.1063/1.112635
10.1063/1.112635
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