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Enhanced negative ion formation in ultraviolet‐laser irradiated silane: Implications for plasma deposition of amorphous silicon
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10.1063/1.112642
/content/aip/journal/apl/65/20/10.1063/1.112642
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/20/10.1063/1.112642
/content/aip/journal/apl/65/20/10.1063/1.112642
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/content/aip/journal/apl/65/20/10.1063/1.112642
1994-11-14
2014-12-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced negative ion formation in ultraviolet‐laser irradiated silane: Implications for plasma deposition of amorphous silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/20/10.1063/1.112642
10.1063/1.112642
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