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Plasma etched polycrystalline hot‐filament chemical vapor deposited diamond thin films and their electrical characteristics
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10.1063/1.112578
/content/aip/journal/apl/65/22/10.1063/1.112578
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/22/10.1063/1.112578
/content/aip/journal/apl/65/22/10.1063/1.112578
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/content/aip/journal/apl/65/22/10.1063/1.112578
1994-11-28
2014-07-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma etched polycrystalline hot‐filament chemical vapor deposited diamond thin films and their electrical characteristics
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/22/10.1063/1.112578
10.1063/1.112578
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