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Mechanisms of implant damage annealing and transient enhanced diffusion in Si
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10.1063/1.112483
/content/aip/journal/apl/65/23/10.1063/1.112483
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/23/10.1063/1.112483
/content/aip/journal/apl/65/23/10.1063/1.112483
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/content/aip/journal/apl/65/23/10.1063/1.112483
1994-12-05
2014-11-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanisms of implant damage annealing and transient enhanced diffusion in Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/23/10.1063/1.112483
10.1063/1.112483
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