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Diffusion of ion implanted Sn in Si, Si1−x Ge x , and Ge
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10.1063/1.112360
/content/aip/journal/apl/65/3/10.1063/1.112360
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/3/10.1063/1.112360
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/content/aip/journal/apl/65/3/10.1063/1.112360
1994-07-18
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Diffusion of ion implanted Sn in Si, Si1−xGex, and Ge
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/3/10.1063/1.112360
10.1063/1.112360
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