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Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition
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10.1063/1.112272
/content/aip/journal/apl/65/6/10.1063/1.112272
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/6/10.1063/1.112272
/content/aip/journal/apl/65/6/10.1063/1.112272
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/content/aip/journal/apl/65/6/10.1063/1.112272
1994-08-08
2014-09-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/65/6/10.1063/1.112272
10.1063/1.112272
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