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Low thermal budget in situ removal of oxygen and carbon on silicon for silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor
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10.1063/1.113254
/content/aip/journal/apl/66/10/10.1063/1.113254
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/10/10.1063/1.113254
/content/aip/journal/apl/66/10/10.1063/1.113254
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/content/aip/journal/apl/66/10/10.1063/1.113254
1995-03-06
2014-10-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low thermal budget insitu removal of oxygen and carbon on silicon for silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/10/10.1063/1.113254
10.1063/1.113254
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