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Diffusion of phosphorus in arsenic and boron doped silicon
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10.1063/1.113219
/content/aip/journal/apl/66/11/10.1063/1.113219
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/11/10.1063/1.113219
/content/aip/journal/apl/66/11/10.1063/1.113219
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/content/aip/journal/apl/66/11/10.1063/1.113219
1995-03-13
2014-11-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Diffusion of phosphorus in arsenic and boron doped silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/11/10.1063/1.113219
10.1063/1.113219
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