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Hydrothermal epitaxy of highly oriented TiO2 thin films on silicon
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10.1063/1.113867
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    Affiliations:
    1 Department of Applied Chemistry, University of Science and Technology of China, Hefei 230026, People’s Republic of China
    2 Structure Research Laboratory, University of Science and Technology of China, Academia Sinica, Hefei 230026, People’s Republic of China,
    3 Center for Advanced Studies in Science and Technology of Microstructures, Nanjing 210093, People’s Republic of China
    4 Structure Research Laboratory, University of Science and Technology of China, Academia Sinica, Hefei 230026, People’s Republic of China,
    5 Center for Advanced Studies in Science and Technology of Microstructures, Nanjing 210093, People’s Republic of China
    Appl. Phys. Lett. 66, 1608 (1995); http://dx.doi.org/10.1063/1.113867
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/content/aip/journal/apl/66/13/10.1063/1.113867
1995-03-27
2014-11-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrothermal epitaxy of highly oriented TiO2 thin films on silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/13/10.1063/1.113867
10.1063/1.113867
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