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Effect of PH3 on the dissociative chemisorption of SiH4 and Si2H6 on Si(100): Implications on the growth of in situ doped Si thin films
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10.1063/1.113318
/content/aip/journal/apl/66/15/10.1063/1.113318
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/15/10.1063/1.113318
/content/aip/journal/apl/66/15/10.1063/1.113318
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/content/aip/journal/apl/66/15/10.1063/1.113318
1995-04-10
2014-07-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of PH3 on the dissociative chemisorption of SiH4 and Si2H6 on Si(100): Implications on the growth of in situ doped Si thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/15/10.1063/1.113318
10.1063/1.113318
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