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Electron beam deposition of gold nanostructures in a reactive environment
1.A. N. Broers, W. W. Molzen, J. J. Cuomo, and N. D. Wittels, Appl. Phys. Lett. 29, 596 (1976).
2.S. Matsui and K. Mori, Jpn. J. Appl. Phys. 23, L706 (1984).
3.R. B. Jackman and J. S. Foord, Appl. Phys. Lett. 49, 196 (1986).
4.S. Matsui and T. Ichihashi, Appl. Phys. Lett. 53, 842 (1988).
5.H. W. P. Koops, R. Weiel, D. P. Kern, and T. H. Baum, J. Vac. Sci. Technol. B 6, 477 (1988).
6.K. L. Lee and M. Hatzakis, J. Vac. Sci. Technol. B 7, 1941 (1989).
7.K. T. Kohlman-von Platten, J. Chlebek, M. Weiss, K. Reimer, H. Oertel, and W. H. Brünger, J. Vac. Sci. Technol. B 11, 2219 (1993).
8.G. D. Danilatos, Micron Microsc. Acta 14, 307 (1983).
9.Our device will be described in detail in a forthcoming paper and was machined by J. Santana and D. Binagui (U.B.).
10.The large size of the deposits and the conductive ITO substrate were chosen only to facilitate the Auger analysis. A microelectrode pattern on the ITO fabricated by T. Gardner served as a landmark to easily locate the deposits.
11.Pure could react with the oil of the ESEM mechanical pump.
12.G. D. Danilatos, Adv. Electron. Electron Phys. 71, 109 (1988).
13.G. Binning, C. F. Quate, and Ch. Gerber, Phys. Rev. Lett. 56, 930 (1986).
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