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Stepwise equilibrated graded Ge x Si1−x buffer with very low threading dislocation density on Si(001)
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10.1063/1.113910
/content/aip/journal/apl/66/16/10.1063/1.113910
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/16/10.1063/1.113910
/content/aip/journal/apl/66/16/10.1063/1.113910
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/content/aip/journal/apl/66/16/10.1063/1.113910
1995-04-17
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stepwise equilibrated graded GexSi1−x buffer with very low threading dislocation density on Si(001)
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/16/10.1063/1.113910
10.1063/1.113910
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