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Comparison of surface roughness of polished silicon wafers measured by light scattering topography, soft‐x‐ray scattering, and atomic‐force microscopy
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10.1063/1.113978
/content/aip/journal/apl/66/18/10.1063/1.113978
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/18/10.1063/1.113978
/content/aip/journal/apl/66/18/10.1063/1.113978
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/content/aip/journal/apl/66/18/10.1063/1.113978
1995-05-01
2014-07-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of surface roughness of polished silicon wafers measured by light scattering topography, soft‐x‐ray scattering, and atomic‐force microscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/66/18/10.1063/1.113978
10.1063/1.113978
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