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SiO2 deposition from oxygen/silane pulsed helicon diffusion plasmas
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10.1063/1.115485
/content/aip/journal/apl/67/1/10.1063/1.115485
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/1/10.1063/1.115485
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/content/aip/journal/apl/67/1/10.1063/1.115485
1995-07-03
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: SiO2 deposition from oxygen/silane pulsed helicon diffusion plasmas
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/1/10.1063/1.115485
10.1063/1.115485
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