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Low‐temperature, uniform, and high‐density plasma produced by a new ultra‐high‐frequency discharge with a spokewise antenna
1.S. Samukawa, Jpn. J. Appl. Phys. 33, 2133 (1994).
2.N. Fujiwara, T. Maruyama, M. Yoneda, and K. Tsukamoto, in Proceedings of the 15th Dry Process Symposium (Institute of Electrical Engineering of Japan, Tokyo, 1993), p. 45.
3.S. Samukawa, Jpn. J. Appl. Phys. 29, 896 (1990).
4.S. Oda, J. Appl. Phys. 29, 1889 (1990).
5.D. L. Flamm, J. Vac. Sci. Technol. A 4, 729 (1986).
6.M. R. Wertheimer and M. Moisan, J. Vac. Sci. Technol. A 3, 2643 (1985).
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