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Fabrication of NiFe thin film elements by dry etching using CH4/H2/O2
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10.1063/1.115160
/content/aip/journal/apl/67/21/10.1063/1.115160
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/21/10.1063/1.115160
/content/aip/journal/apl/67/21/10.1063/1.115160
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/content/aip/journal/apl/67/21/10.1063/1.115160
1995-11-20
2014-09-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of NiFe thin film elements by dry etching using CH4/H2/O2
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/21/10.1063/1.115160
10.1063/1.115160
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