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Thickness profiles of SiO2 films deposited from tetraethoxysilane/O3 precursors in ultra‐high‐aspect‐ratio capillaries
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10.1063/1.115222
/content/aip/journal/apl/67/22/10.1063/1.115222
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/22/10.1063/1.115222
/content/aip/journal/apl/67/22/10.1063/1.115222
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/content/aip/journal/apl/67/22/10.1063/1.115222
1995-11-27
2014-12-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thickness profiles of SiO2 films deposited from tetraethoxysilane/O3 precursors in ultra‐high‐aspect‐ratio capillaries
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/22/10.1063/1.115222
10.1063/1.115222
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