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Structural characterization of aluminum films deposited on sputtered‐titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane
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10.1063/1.115268
/content/aip/journal/apl/67/23/10.1063/1.115268
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/23/10.1063/1.115268
/content/aip/journal/apl/67/23/10.1063/1.115268
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/content/aip/journal/apl/67/23/10.1063/1.115268
1995-12-04
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Structural characterization of aluminum films deposited on sputtered‐titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/23/10.1063/1.115268
10.1063/1.115268
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