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Dose loss in phosphorus implants due to transient diffusion and interface segregation
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10.1063/1.114543
/content/aip/journal/apl/67/4/10.1063/1.114543
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/4/10.1063/1.114543
/content/aip/journal/apl/67/4/10.1063/1.114543
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/content/aip/journal/apl/67/4/10.1063/1.114543
1995-07-24
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dose loss in phosphorus implants due to transient diffusion and interface segregation
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/4/10.1063/1.114543
10.1063/1.114543
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