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Improved direct bonding of Si and SiO2 surfaces by cleaning in H2SO4:H2O2:HF
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10.1063/1.115191
/content/aip/journal/apl/67/5/10.1063/1.115191
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/5/10.1063/1.115191
/content/aip/journal/apl/67/5/10.1063/1.115191
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/content/aip/journal/apl/67/5/10.1063/1.115191
1995-07-31
2014-11-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improved direct bonding of Si and SiO2 surfaces by cleaning in H2SO4:H2O2:HF
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/5/10.1063/1.115191
10.1063/1.115191
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