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Effects of Si thermal oxidation on B diffusion in Si and strained Si1−x Ge x layers
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10.1063/1.115281
/content/aip/journal/apl/67/5/10.1063/1.115281
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/5/10.1063/1.115281
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/content/aip/journal/apl/67/5/10.1063/1.115281
1995-07-31
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of Si thermal oxidation on B diffusion in Si and strained Si1−xGex layers
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/5/10.1063/1.115281
10.1063/1.115281
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