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The influence of aluminum concentration on photoelectrochemical etching of first order gratings in GaAs/AlGaAs
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10.1063/1.115000
/content/aip/journal/apl/67/9/10.1063/1.115000
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/9/10.1063/1.115000
/content/aip/journal/apl/67/9/10.1063/1.115000
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/content/aip/journal/apl/67/9/10.1063/1.115000
1995-08-28
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The influence of aluminum concentration on photoelectrochemical etching of first order gratings in GaAs/AlGaAs
http://aip.metastore.ingenta.com/content/aip/journal/apl/67/9/10.1063/1.115000
10.1063/1.115000
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