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Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas
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10.1063/1.116772
/content/aip/journal/apl/68/1/10.1063/1.116772
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/1/10.1063/1.116772
/content/aip/journal/apl/68/1/10.1063/1.116772
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/content/aip/journal/apl/68/1/10.1063/1.116772
1996-01-01
2014-12-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/1/10.1063/1.116772
10.1063/1.116772
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