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Control of process uniformity by using electron cyclotron resonance plasma produced by multiannular antenna
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10.1063/1.116259
/content/aip/journal/apl/68/11/10.1063/1.116259
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/11/10.1063/1.116259
/content/aip/journal/apl/68/11/10.1063/1.116259
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/content/aip/journal/apl/68/11/10.1063/1.116259
1996-03-11
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Control of process uniformity by using electron cyclotron resonance plasma produced by multiannular antenna
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/11/10.1063/1.116259
10.1063/1.116259
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