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Generation of hole traps in thin silicon oxide layers under high‐field electron injection
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10.1063/1.116026
/content/aip/journal/apl/68/13/10.1063/1.116026
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/13/10.1063/1.116026
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/content/aip/journal/apl/68/13/10.1063/1.116026
1996-03-25
2015-05-07
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Generation of hole traps in thin silicon oxide layers under high‐field electron injection
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/13/10.1063/1.116026
10.1063/1.116026
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