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Electrical properties of Ta2O5 films obtained by plasma enhanced chemical vapor deposition using a TaF5 source
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10.1063/1.116663
/content/aip/journal/apl/68/13/10.1063/1.116663
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/13/10.1063/1.116663
/content/aip/journal/apl/68/13/10.1063/1.116663
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/content/aip/journal/apl/68/13/10.1063/1.116663
1996-03-25
2014-11-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical properties of Ta2O5 films obtained by plasma enhanced chemical vapor deposition using a TaF5 source
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/13/10.1063/1.116663
10.1063/1.116663
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