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Nondestructive measurement of interfacial SiO2 films formed during deposition and annealing of Ta2O5
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10.1063/1.115627
/content/aip/journal/apl/68/14/10.1063/1.115627
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/14/10.1063/1.115627
/content/aip/journal/apl/68/14/10.1063/1.115627
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/content/aip/journal/apl/68/14/10.1063/1.115627
1996-04-01
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nondestructive measurement of interfacial SiO2 films formed during deposition and annealing of Ta2O5
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/14/10.1063/1.115627
10.1063/1.115627
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