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Selective solid phase crystallization for control of grain size and location in Ge thin films on silicon dioxide
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10.1063/1.116514
/content/aip/journal/apl/68/24/10.1063/1.116514
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/24/10.1063/1.116514
/content/aip/journal/apl/68/24/10.1063/1.116514
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/content/aip/journal/apl/68/24/10.1063/1.116514
1996-06-10
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective solid phase crystallization for control of grain size and location in Ge thin films on silicon dioxide
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/24/10.1063/1.116514
10.1063/1.116514
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