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Influence of dislocation loops created by amorphizing implants on point defect and boron diffusion in silicon
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10.1063/1.116640
/content/aip/journal/apl/68/25/10.1063/1.116640
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/25/10.1063/1.116640
/content/aip/journal/apl/68/25/10.1063/1.116640
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/content/aip/journal/apl/68/25/10.1063/1.116640
1996-06-17
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of dislocation loops created by amorphizing implants on point defect and boron diffusion in silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/25/10.1063/1.116640
10.1063/1.116640
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