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Nonlinear optical properties of photoresists for projection lithography
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10.1063/1.116411
/content/aip/journal/apl/68/4/10.1063/1.116411
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/4/10.1063/1.116411
/content/aip/journal/apl/68/4/10.1063/1.116411
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/content/aip/journal/apl/68/4/10.1063/1.116411
1996-01-22
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nonlinear optical properties of photoresists for projection lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/4/10.1063/1.116411
10.1063/1.116411
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