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Roughening kinetics of chemical vapor deposited copper films on Si(100)
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10.1063/1.115954
/content/aip/journal/apl/68/9/10.1063/1.115954
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/9/10.1063/1.115954
/content/aip/journal/apl/68/9/10.1063/1.115954
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/content/aip/journal/apl/68/9/10.1063/1.115954
1996-02-26
2015-01-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Roughening kinetics of chemical vapor deposited copper films on Si(100)
http://aip.metastore.ingenta.com/content/aip/journal/apl/68/9/10.1063/1.115954
10.1063/1.115954
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