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Evaluation of depth profile of defects in ultrathin Si film on buried SiO2 formed by implanted oxygen
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10.1063/1.117438
/content/aip/journal/apl/69/10/10.1063/1.117438
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/10/10.1063/1.117438
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/content/aip/journal/apl/69/10/10.1063/1.117438
1996-09-02
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Evaluation of depth profile of defects in ultrathin Si film on buried SiO2 formed by implanted oxygen
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/10/10.1063/1.117438
10.1063/1.117438
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