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High quality fluorinated silicon oxide films prepared by plasma enhanced chemical vapor deposition at 120 °C
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10.1063/1.117463
/content/aip/journal/apl/69/13/10.1063/1.117463
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/13/10.1063/1.117463
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/content/aip/journal/apl/69/13/10.1063/1.117463
1996-09-23
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High quality fluorinated silicon oxide films prepared by plasma enhanced chemical vapor deposition at 120 °C
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/13/10.1063/1.117463
10.1063/1.117463
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