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Kinetic roughening and smoothing of the crystalline–amorphous interface during solid phase epitaxial crystallization of GeSi alloy layers
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10.1063/1.117675
/content/aip/journal/apl/69/18/10.1063/1.117675
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/18/10.1063/1.117675
/content/aip/journal/apl/69/18/10.1063/1.117675
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/content/aip/journal/apl/69/18/10.1063/1.117675
1996-10-28
2014-08-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Kinetic roughening and smoothing of the crystalline–amorphous interface during solid phase epitaxial crystallization of GeSi alloy layers
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/18/10.1063/1.117675
10.1063/1.117675
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