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Improved electron‐beam patterning of Si with self‐assembled monolayers
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10.1063/1.116959
/content/aip/journal/apl/69/27/10.1063/1.116959
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/27/10.1063/1.116959
/content/aip/journal/apl/69/27/10.1063/1.116959
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/content/aip/journal/apl/69/27/10.1063/1.116959
1996-12-30
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improved electron‐beam patterning of Si with self‐assembled monolayers
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/27/10.1063/1.116959
10.1063/1.116959
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