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Formation of ultrathin, buried oxides in Si by O+ ion implantation
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10.1063/1.117802
/content/aip/journal/apl/69/5/10.1063/1.117802
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/5/10.1063/1.117802
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/content/aip/journal/apl/69/5/10.1063/1.117802
1996-07-29
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation of ultrathin, buried oxides in Si by O+ ion implantation
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/5/10.1063/1.117802
10.1063/1.117802
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