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Effects of electron temperature in high‐density Cl2 plasma for precise etching processes
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10.1063/1.116929
/content/aip/journal/apl/69/8/10.1063/1.116929
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/8/10.1063/1.116929
/content/aip/journal/apl/69/8/10.1063/1.116929
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/content/aip/journal/apl/69/8/10.1063/1.116929
1996-08-19
2014-08-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of electron temperature in high‐density Cl2 plasma for precise etching processes
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/8/10.1063/1.116929
10.1063/1.116929
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