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Stability of hot‐wire deposited amorphous‐silicon thin‐film transistors
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10.1063/1.116931
/content/aip/journal/apl/69/8/10.1063/1.116931
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/8/10.1063/1.116931
/content/aip/journal/apl/69/8/10.1063/1.116931
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/content/aip/journal/apl/69/8/10.1063/1.116931
1996-08-19
2014-12-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stability of hot‐wire deposited amorphous‐silicon thin‐film transistors
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/8/10.1063/1.116931
10.1063/1.116931
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