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Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor
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10.1063/1.117423
/content/aip/journal/apl/69/9/10.1063/1.117423
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/9/10.1063/1.117423
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/content/aip/journal/apl/69/9/10.1063/1.117423
1996-08-26
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor
http://aip.metastore.ingenta.com/content/aip/journal/apl/69/9/10.1063/1.117423
10.1063/1.117423
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