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GROWTH OF THIN METAL FILMS UNDER APPLIED ELECTRIC FIELD
1.C. A. Bassett, J. W. Menter, and D. W. Pashley, Structure and Properties of Thin Films, edited by C. A. Neugebauer et al., John Wiley & Sons, Inc., New York, (1959), p. 11.
2.D. W. Pashley, M. J. Stowell, M. H. Jacobs, and T. J. Law, Phil. Mag. 10, 127 (1964).
3.K. R. Lawless, J. Vac. Sci. & Tech. 2, 29 (1965).
4.K. L. Chopra, L. C. Bobb, and M. H. Francombe, J. Appl. Phys. 34, 1699 (1963).
5.V. M. Kosevich, L. S. Platnik, S. I. Shevchenko, and V. A. Antonova, Soviet Phys.‐Solid State 6, 2591 (1965).
6.F. Witt, Proc. Europ Reg. Conf. Electron Microscopy 1, editors, L. Houwink and B. J. Spit Delft (1960) p. 341.
7.J. P. Hirth and G. M. Pound, Progress in Materials science, edited by B. Chalmers (Pergamon Press), p. 27, 1964.
8.D. B. Dove, J. Appl. Phys. 35, 2785 (1964).
9.Movie film depicting this behavior is available to those interested.
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