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In situ Si flux cleaning technique for producing atomically flat Si(100) surfaces at low temperature
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10.1063/1.119083
/content/aip/journal/apl/70/17/10.1063/1.119083
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/17/10.1063/1.119083
/content/aip/journal/apl/70/17/10.1063/1.119083
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/content/aip/journal/apl/70/17/10.1063/1.119083
1997-04-28
2014-08-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ Si flux cleaning technique for producing atomically flat Si(100) surfaces at low temperature
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/17/10.1063/1.119083
10.1063/1.119083
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