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Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
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10.1063/1.118988
/content/aip/journal/apl/70/20/10.1063/1.118988
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/20/10.1063/1.118988
/content/aip/journal/apl/70/20/10.1063/1.118988
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/content/aip/journal/apl/70/20/10.1063/1.118988
1997-05-19
2014-09-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/20/10.1063/1.118988
10.1063/1.118988
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