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Depth analysis of phase formation in Si after high-dose Fe ion implantation by depth-selective conversion-electron Mössbauer spectroscopy
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10.1063/1.118996
/content/aip/journal/apl/70/20/10.1063/1.118996
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/20/10.1063/1.118996
/content/aip/journal/apl/70/20/10.1063/1.118996
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/content/aip/journal/apl/70/20/10.1063/1.118996
1997-05-19
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Depth analysis of phase formation in Si after high-dose Fe ion implantation by depth-selective conversion-electron Mössbauer spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/20/10.1063/1.118996
10.1063/1.118996
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