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Effects of in situ doping from and on hydrogen desorption and the low-temperature growth mode of Si on Si(100) by remote plasma enhanced chemical vapor deposition
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10.1063/1.119207
/content/aip/journal/apl/70/21/10.1063/1.119207
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/21/10.1063/1.119207
/content/aip/journal/apl/70/21/10.1063/1.119207
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/content/aip/journal/apl/70/21/10.1063/1.119207
1997-05-26
2014-12-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of in situ doping from B2H6 and PH3 on hydrogen desorption and the low-temperature growth mode of Si on Si(100) by remote plasma enhanced chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/21/10.1063/1.119207
10.1063/1.119207
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