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Transient enhanced diffusion of Sb and B due to MeV silicon implants
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10.1063/1.119150
/content/aip/journal/apl/70/24/10.1063/1.119150
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/24/10.1063/1.119150
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/content/aip/journal/apl/70/24/10.1063/1.119150
1997-06-16
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Transient enhanced diffusion of Sb and B due to MeV silicon implants
http://aip.metastore.ingenta.com/content/aip/journal/apl/70/24/10.1063/1.119150
10.1063/1.119150
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